Researchers from the Fritz Haber Institute of the Max Planck Society have unveiled fundamental new insights into the working ...
Atomic layer etching (ALE) and atomic layer deposition (ALD) represent pivotal techniques in nanofabrication, enabling control of material removal and growth at the atomic scale. By utilising ...
Researchers from the Fritz Haber Institute of the Max Planck Society have unveiled fundamental new insights into the working ...
Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...
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